The CfM will use the equipment and expertise of the many materials, photonics and metamaterials laboratories at the partner universities, as well as those at other NSF I/UCRCs (including the Center for Electromagnetic Compatibility and the Center for Dielectric Studies) and some of the member companies and government agencies. The main research facilities include:
Core Facilities
➢ Clarkson: The Center for Advanced Materials Processing
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Scanning and transmission electron microscopes
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JEOL 2010 High Resolution Scanning Transmission Electron Microscope
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JEOL 7400 High Resolutions Field Emission Electron Microscope
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JEOL 6300 Scanning Electron Microscope
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JEOL JEM1200 EX Transmission Electron Microscope
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Nuclear magnetic resonance equipment
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ALV Simultaneous Static and Dynamic Light Scattering Analyzer
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Plasma and CVD equipment
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X-ray facilites
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Particle characterization equipment
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Surface characterization equipment
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Malvern 2000 Laser Diffraction Particle Size Analyzer
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Thermal Gravimetric Analyzer TGA 7 Perkin Elmer
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Bruker D8 X-Ray Diffractometer
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Atomic Force Microscope
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N2 BET surface area measurement device
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Viscometers
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Hysitron TI950 Triboindenter System
➢ UNCC: The Center for Optoelectronics and Optical Communications
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Clean Room Facility (3,000 sq. ft., including advanced lithography and processing, for the fabrication of complex optoelectronic devices and integrated circuits, including a Molecular Imprint Inc. Imprio 100 nanoimprint tool)
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Optoelectronic and Optical Device Fabrication Facility
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Optical Characterization and Measurement Facility
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Optical Communication Infrastructure Facility
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Optical Metrology Facility
➢ UNCC: Advanced Microelectronic Materials Laboratory
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Ultra-High Vacuum Molecular Beam Epitaxy system used to grow high quality crystalline material films
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Molecular Beam Epitaxy system used to grow high quality crystalline III-V materials
➢ UNCC: The Microelectronics Fabrication Laboratory
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The fabrication laboratory includes 8 high temperature furnaces manufactured by Corso-Gray, Thermco, and Lindberg. These furnaces are used for high purity silicon oxidations, n and p type doping and diffusion, and high temperature anneals.
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The lab has complete photolithography capability including wafer spin coating, direct contact mask exposure with a HTG contact mask aligner, and developing facilities.
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Technics Micro-Plasma series 900 plasma system, Texas Instruments A-24-D PECVD tool, or an IBM designed reactive ion etch tool.
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Cooke thermal evaporator, Cooke e-beam evaporator, Varian 3125 4 pocket e-beam evaporator, a CHA Mark 50 four pocket e-beam evaporator, and a CVC AST-601 3 target sputtering tool.
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The lab includes various inspection microscopes and measurement tools including a Nanometrics Nanopsec AFT 200 automatic thickness tool, Tencor Alpha Step 200 surface profiler, and a Westbond gold wire ball bonder is also available.
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A Micromanipulator probe station with Tektronix 576 curve tracer and a HP Parametric Tester is available for electrical measurements.
➢ UNCC 3-D printing capabilities
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Stratasys Prodigy Plus (FDM) 300nm resolution (ABS)
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3DSystems Z-Corp 310, 510 (Powderbed) 100nm resolution
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Stratasys Dimension 3D (FDM) 300nm resolution (ABS)
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3DSystems Vflash (DLP) 100nm resolution (photopolymer)
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FormLabs Form 1+ (SLA) 25nm resolution (photopolymer)
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PWDR (3DP) 50nm resolution (inkjet powder)
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3DSystems Dimension BST 768 (FDM) 300nm resolution (ABS)
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3DSystems Dimension SST 1200es (FDM) 300nm resolution (ABS)
➢ CUNY: The Metamaterials Research and Development Laboratory
High Performance Computing Cluster – A 10-node HPC cluster, accessed by 10 distributed workstations, with numerous memamaterial design and simulation programs including: Ansoft’s HFSS, Sonnet Software’s CST Microwave Studio, COMSOL Multiphyiscs, Zemax, Matlab, Silvaco Atlas, and Athena
Prototype Development Facility:
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6300 x10 i-line steppers
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RIE
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Electrochemical deposition kit
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Gamry Reference 600 Potentiostat/Galvanostat/ZRA
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Chemical mechanical polishers
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Wire bonder (West Bond)
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FTIR (NEXUS) and continuum IR microscope
➢ CUNY: The Center for Advanced Technology (CAT) in Photonics Applications
Please follow the link to view a full list of CUNY CAT equipment: http://www.cuny.edu/site/cat/facilities-equipment.html
➢ CUNY: The Institute for Ultrafast Lasers and Spectroscopy
Please follow the link to read more about IUSL: http://www.ccny.cuny.edu/iusl/
Collaborating Centers and Ancillary Facilities
➢ The Center for Electromagnetic Compatibility
➢ The Center for Dielectric Studies
➢ The Cornell Nanoscale Science and Technology Facility (additional fabrication tasks)
➢ The Center for Functional Nanomaterials at Brookhaven National Laboratory